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On the sensitivity of transient photodecay measurements as a probe of localised state distributions in amorphous semiconductors
Authors:JM Marshall  RA Street
Institution:Xerox Palo Alto Research Centre 3333 Coyote Hill Road, Palo Alto, CA 94304, U.S.A.
Abstract:An investigation is reported of the extent to which structure in the density of localised states in amorphous semiconductor films may be detected from photodecay measurements. Transient photocurrents are computed by a Monte Carlo technique, for the case of an exponential tail of states upon which a sharp rectangular feature has been superimposed. It is shown that a ‘rectangular’ component of energy width kT must protrude from the background exponential tail by at least a factor of 5 in density, in order to exert a readily-detectable influence upon the transient photodecay. It is further demonstrated that the presence of deep-lying features in the distribution of localised states may easily modify the transient decay over a wide range of time; underlining the difficulty of interpreting such data.
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