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Orthogonal Aberration Functions for Microlithographic Optics |
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| Authors: | Tomoyuki Matsuyama Tomoko Ujike |
| Affiliation: | (1) Optical Development Department, Precision Equipment Company, Nikon Corporation, 201-9, Miizugahara, Kumagaya 360-8559, Japan;(2) Imaging Technology Development Department, Core Technology Center, Nikon Corporation, 201-9, Miizugahara, Kumagaya 360-8559, Japan |
| Abstract: | Newly developed orthogonal aberration functions are reviewed. The new functions can be utilized to express aberrations of a high NA and wide field optical system like a microlithographic projection lens. The new functions are orthogonal to each other and expressed by a simple combination of Zernike function(s) of pupil coordinates and Zernike function(s) of field coordinates. |
| Keywords: | aberration functions Zernike polynomials orthogonalization microlithographic lens wavefront aberration |
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