Electric field dependence of the dielectric susceptibility in K1−xLixTaO3期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

Electric field dependence of the dielectric susceptibility in K_1−xLi_xTaO₃

Authors:	U.T. Höchli D. Rytz J.J. Van der Klink F. Borsa

Affiliation:	IBM Zurich Research Laboratory, 8803 Rüschlikon, Switzerland;Institut de Physique Expérimentale, Swiss Federal Institute of Technology, 1015 Lausanne, Switzerland;Istituto di Fisica dell''Università e Unità Gruppo Nazionale di Structtura della Materia del Consiglio Nazionale delle Ricerche, 27100 Pavia, Italy

Abstract:	Results are presented for the dielectric function $ε1 = ε_{1} + iε_{2}$ in K_1?xLi_xTaO₃ in the frequency range 10 < f < 10⁶ Hz and for several fields. The data are analysed in terms of dielectric relaxation, and it is shown that the electric bias field modifies the relaxation behaviour drastically.

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