Sputtering of highly oriented pyrolytic graphite with 30 keV Argon ions |
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Authors: | N. N. Andrianova A. M. Borisov E. S. Mashkova |
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Affiliation: | (1) Skobeltsyn Institute of Nuclear Physics, Moscow State University, Moscow, 119991, Russia |
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Abstract: | The influence of the incidence angle of 30 keV Ar+ ions, ion fluence and target temperature on the sputtering yield and surface microgeometry of highly oriented pyrolytic graphite (UPV-1T) samples was experimentally studied. It was found that at fluences more than 5 × 1019 ion cm?2 the sputtering yield at room temperature in the range of the ion incidence angle from 0° to 80° is twice as small as the corresponding experimental data for both polycrystalline graphite and glassy carbon. The analysis of ion-induced relief permits us to suppose the topographical suppression mechanism of highly oriented pyrolytic graphite sputtering. |
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