Effect of surface roughness and chemical composition on the wetting properties of silicon-based substrates |
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| Authors: | Yannick Coffinier Gaëlle Piret Manash R. Das Rabah Boukherroub |
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| Affiliation: | 1. Institut de Recherche Interdisciplinaire (IRI), CNRS USR 3078, Université Lille 1, Parc de la Haute Borne, 50, avenue de Halley, BP 70478, 59658 Villeneuve d’Ascq cedex, France;2. Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN), UMR CNRS 8520, Université Lille 1, Cité Scientifique, avenue Poincaré, BP 60069, 59652 Villeneuve d’Ascq, France |
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| Abstract: | The article reports on the wetting properties of silicon-based materials as a function of their roughness and chemical composition. The investigated surfaces consist of hydrogen-terminated and chemically modified atomically flat crystalline silicon, porous silicon and silicon nanowires. The hydrogenated surfaces are functionalized with 1-octadecene or undecylenic acid under thermal conditions. The changes occurring upon surface functionalization are characterized using Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS) spectroscopy and water contact angle measurements. By increasing the surface roughness, the static water contact angle increases. The combination of high surface roughness with chemical functionalization with water repellent coating (1-octadecene) enables reaching superhydrophobicity (water contact angle greater than 150°) for silicon nanowires. |
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