| 附着铜膜的内应力及屈服强度 |
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| 引用本文： | 张建民,张研,徐可为. 附着铜膜的内应力及屈服强度[J]. 中国物理, 2005, 14(5): 1006-1010 |
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| 作者姓名： | 张建民 张研 徐可为 |
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| 作者单位： | College of Physics and Information Technology, Shaanxi Normal University, Xi’an 710062, China;College of Physics and Information Technology, Shaanxi Normal University, Xi’an 710062, China;State Key Laboratory for Mechanical Behavior of Materials, Xi’an Jiaotong University, Xi’an 710049, China |
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| 基金项目： | Project supported by the National Natural Science Foundation of China (Grant No 50271038) |
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| 摘 要： | 用X-射线衍射和热循环基片弯曲方法测量了附着在基体上纯铜膜的内应力和屈服强度。内应力为张应力且随工作气体（氩气）压强的增加而减小但随膜厚的增加而增加。钢基体上铜膜的张屈服强度与膜厚的倒数成反比。压屈服强度也同样依赖于膜厚，即膜越薄，压屈服强度越高。
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| 关 键 词： | 铜膜；内应力；屈服强度；X-射线衍射；热循环基体弯曲 |
| 收稿时间： | 2003-12-23 |
Internal stress and yield strength of copper films on substrates |
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| Zhang Jian-Min,Zhang Yan and Xu Ke-Wei. Internal stress and yield strength of copper films on substrates[J]. Chinese Physics, 2005, 14(5): 1006-1010 |
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| Authors: | Zhang Jian-Min Zhang Yan Xu Ke-Wei |
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| Affiliation: | College of Physics and Information Technology, Shaanxi Normal University, Xi’an 710062, China; State Key Laboratory for Mechanical Behavior of Materials, Xi’an Jiaotong University, Xi’an 710049, China |
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| Abstract: | Internal stress and yield strength of pure copper films on substrates were characterized by X-ray diffraction and thermal-cycle substrate curvature methods. The internal stress was of tension, and decreased with increasing working-gas (argon) pressure and increased with increasing film thickness. Tensile yield strength of copper film on steel substrate was reciprocal to the film thickness. Similarly, the compressive yield strength depended strongly on the film thickness, the thinner the film thickness, the larger the compressive yield strength. |
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| Keywords: | copper film internal stress yield strength X-ray diffraction thermal-cycle substrate curvature |
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