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硬质合金CVD金刚石涂层工具衬底前处理技术研究
引用本文:来清民,张玉英,苗晋琦,唐伟忠,吕反修.硬质合金CVD金刚石涂层工具衬底前处理技术研究[J].人工晶体学报,2005,34(2):374-379.
作者姓名:来清民  张玉英  苗晋琦  唐伟忠  吕反修
作者单位:河南教育学院,郑州,450014;中国地质大学,北京,100083;北京科技大学,北京,100080
摘    要:本研究采用KOH:K3Fe(CN)6]:H2O和H2SO4:H2O2两种溶液浸蚀硬质合金衬底,分别选择刻蚀WC和Co.并在浸蚀过的硬质合金衬底上,用强电流直流伸展电弧等离子体CVD法沉积金刚石涂层.研究表明,两步混合处理法不仅可以有效的去除硬质合金基体表面的钴,而且,还可显著粗化硬质合金衬底.因此,提高了金刚石薄膜的质量和涂层的附着力.

关 键 词:硬质合金  两步法  表面前处理  金刚石涂层  附着力
文章编号:1000-985X(2005)02-0374-06

A Study of Surface Pretreatment Technology on Cemented Carbide Substrates for CVD Diamond Coating
LAI Qing-min,ZHANG Yu-ying,MIAO Jin-qi,TANG Wei-zhong,LU Fan-xiu.A Study of Surface Pretreatment Technology on Cemented Carbide Substrates for CVD Diamond Coating[J].Journal of Synthetic Crystals,2005,34(2):374-379.
Authors:LAI Qing-min  ZHANG Yu-ying  MIAO Jin-qi  TANG Wei-zhong  LU Fan-xiu
Institution:LAI Qing-min~1,ZHANG Yu-ying~1,MIAO Jin-qi~2,TANG Wei-zhong~3,LU Fan-xiu~3
Abstract:Two kinds of solutions(KOH:K_3Fe(CN)_6]:H_2O and H_2SO_4:H_2O_2)were utilized to etch the surface WC and Co on the cemented carbide substrates. Diamond films were deposited by means of the high current extended DC arc plasma CVD technique. The results show that the two-step method can effectively remove Co on the cemented carbide substrates and obviously roughen the surface of the cemented carbide substrate. As a result, both the quality and the adhesion of diamond coatings were improved.
Keywords:cemented carbide  two-step method  surface pretreatment  diamond coatings  adhesion
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