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CW DF/HF化学激光器性能与流场参数的相互关系
引用本文:袁圣付,赵伊君,华卫红,姜宗福,YUAN Sheng-fu.CW DF/HF化学激光器性能与流场参数的相互关系[J].中国激光,2001,28(5):402-406.
作者姓名:袁圣付  赵伊君  华卫红  姜宗福  YUAN Sheng-fu
作者单位:1. 国防科技大学理学院
2. Science College, National University of Defence Techonology,
摘    要:从增益系数、输出功率、激光效率的基本公式出发 ,得到了CWDF HF化学激光器性能对光腔中F和D2 H2反应区流场参数的依赖关系。利用数值模拟结果对该关系进行了验证。给出了提高CWDF HF化学激光器性能的F和D2 H2 反应区流场参数要求 ,为CWDF HF化学激光器喷管设计提供了依据

关 键 词:CW  DF/HF化学激光  增益系数  输出功率  激光效率  数值模拟
收稿时间:2000/1/17

Dependence of CW DF/HF Chemical Laser Performance on the Flowfield Parameters
YUAN Sheng,fu,ZHAO Yi,jun,HUA Wei,hong,JIANG Zong,fu.Dependence of CW DF/HF Chemical Laser Performance on the Flowfield Parameters[J].Chinese Journal of Lasers,2001,28(5):402-406.
Authors:YUAN Sheng  fu  ZHAO Yi  jun  HUA Wei  hong  JIANG Zong  fu
Abstract:The relation between CW DF/HF chemical laser performance and the flowfield parameters in F&D2/H2 reacting zone has been studied based on the original formula of gain coefficient,output power and laser efficiency. The relation is proved by simulation results and others′ experiments and provides a criterion to optimize the nozzle design and CW DF/HF chemical laser performance.
Keywords:CW DF/HF chemical laser  gain coefficient  output power  laser efficiency  numerical simulation
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