| 电致变色氧化钨薄膜锂离子阈值注入量的研究 |
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| 引用本文： | 叶永红,顾培夫.电致变色氧化钨薄膜锂离子阈值注入量的研究[J].光学学报,1996,16(4):63-566. |
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| 作者姓名： | 叶永红 顾培夫 |
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| 作者单位： | 浙江大学光科系薄膜室!杭州310027 |
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| 摘 要： | 探讨了ＷＯ３薄膜与１ＭＬｉＣｌＯ４－ＰＣ溶液之间的界面电位差的变化规律及测量方法，制备了三种具有不同电致变色性能的ＷＯ３薄膜，并对它们进行了界面电位差随Ｌｉ＾＋注入量大小变化的测量，通过实验发现，界面电位差的变化趋势能够反映出氧化钨薄膜的Ｌｉ＾＋离子阈值注入量的大小。进而找到了用电阻热蒸发方法制备了电致变色氧化钨薄膜的最佳工艺条件。
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| 关 键 词： | 电致变色 界面电位差 薄膜 氧化钨 |
| 收稿时间： | 1995/4/6 |
The Limited Maximum Number of Injected Lithium Ions in Electrochromic WO_3 Film |
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| Ye Yonghong, Gu Peifu, Liu Xu, Tang Jingfa.The Limited Maximum Number of Injected Lithium Ions in Electrochromic WO_3 Film[J].Acta Optica Sinica,1996,16(4):63-566. |
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| Authors: | Ye Yonghong Gu Peifu Liu Xu Tang Jingfa |
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| Abstract: | The interface potential of WO3 film and lMLiClO4- PC solution and its measurement are discussed. Three kinds of WO3 films with different electrochromism proPerties were made, and their variation of the interface potentials were measured as a function of the number of Li + ions injected into WO3 film. It is found that the limited maximum number of injected Li+ ions is predicable through the variation trendaney of interface potential. The best deposition parameters of thermal evaporation for electrochromic WO3 film are obtained |
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| Keywords: | electrochromism the interface potential the limited maximum number of injected Li~+ ions |
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