| 用化学镀方法在不同衬底上制备纳米尺度金属插塞电极的研究 |
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| 引用本文： | 程凯芳,王晓峰,王晓东,张加勇,马慧莉,陈小刚,刘波,宋志棠,封松林,杨富华.用化学镀方法在不同衬底上制备纳米尺度金属插塞电极的研究[J].半导体学报,2011,32(4):046001-5. |
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| 作者姓名： | 程凯芳 王晓峰 王晓东 张加勇 马慧莉 陈小刚 刘波 宋志棠 封松林 杨富华 |
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| 作者单位： | 中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所,中国科学院半导体研究所 |
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| 基金项目： | 国家高技术研究发展计划 |
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| 摘 要： | 纳米尺度金属插塞电极在现代纳米电子学中有很重要的应用价值。本文研究了用化学镀方法制备纳米尺度金属插塞电极，具有简单、低成本和自选择性的优点。化学镀甚至可以分别在硅衬底、钨衬底和氮化钛衬底上制备出直径小于50纳米的镍插塞电极。用能量色散X射线微量分析仪（EDXM）测定出用化学镀在硅衬底上制备出的纳米尺度插塞电极的主要成分是镍。最后，采用化学镀方法，制备了直径为9微米的插塞电极的垂直结构相变存储器器件。通过研究器件的电流-电压特性表明，化学镀方法可以满足器件应用要求。因此，用简单、低成本的化学镀方法来制备纳米尺度金属插塞电极，对器件的应用有重要意义。
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| 关 键 词： | 低成本制造 化学沉积 金属 基材 随机存取存储器 发光过程 ELD 能量色散 |
| 收稿时间： | 9/26/2010 3:37:07 PM |
Simple and low-cost fabrication of a metal nanoplug on various substrates by electroless deposition |
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| Cheng Kaifang,Wang Xiaofeng,Wang Xiaodong,Zhang Jiayong,Ma Huili,Chen Xiaogang,Liu Bo,Song Zhitang,Feng Songlin and Yang Fuhua.Simple and low-cost fabrication of a metal nanoplug on various substrates by electroless deposition[J].Chinese Journal of Semiconductors,2011,32(4):046001-5. |
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| Authors: | Cheng Kaifang Wang Xiaofeng Wang Xiaodong Zhang Jiayong Ma Huili Chen Xiaogang Liu Bo Song Zhitang Feng Songlin and Yang Fuhua |
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| Institution: | Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy;Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy;Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy |
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| Abstract: | |
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| Keywords: | electroless deposition nanoplug anodic aluminum oxide template |
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