Thermodynamic analysis of preparation processes for boron-containing films with the use of N-trimethylborazine and hydrogen |
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Authors: | A A Titov A N Golubenko M L Kosinova F A Kuznetsov |
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Institution: | 1.Nikolaev Institute of Inorganic Chemistry, Siberian Division,Russian Academy of Sciences,Novosibirsk,Russia;2.Novosibirsk State University,Novosibirsk,Russia |
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Abstract: | The possibilities for using a minimization program for Gibbs energy functions (G
min) in multiphase multicomponent systems are illustrated. The process of chemical vapor deposition in a B-C-N-H-O system at
reduced pressure (13.3 Pa) over a wide range of synthesis temperatures (300–1300 K) with the use of an initial gas mixture
of N-trimethylborazine and hydrogen is modeled thermodynamically. The possibility of obtaining films of different compositions
is shown, and the boundary conditions for the deposition of coatings of the general composition BC
x
N
y
are determined. |
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Keywords: | |
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