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Thermodynamic analysis of preparation processes for boron-containing films with the use of N-trimethylborazine and hydrogen
Authors:A A Titov  A N Golubenko  M L Kosinova  F A Kuznetsov
Institution:1.Nikolaev Institute of Inorganic Chemistry, Siberian Division,Russian Academy of Sciences,Novosibirsk,Russia;2.Novosibirsk State University,Novosibirsk,Russia
Abstract:The possibilities for using a minimization program for Gibbs energy functions (G min) in multiphase multicomponent systems are illustrated. The process of chemical vapor deposition in a B-C-N-H-O system at reduced pressure (13.3 Pa) over a wide range of synthesis temperatures (300–1300 K) with the use of an initial gas mixture of N-trimethylborazine and hydrogen is modeled thermodynamically. The possibility of obtaining films of different compositions is shown, and the boundary conditions for the deposition of coatings of the general composition BC x N y are determined.
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