| Abstract: | High molecular weight block interrupt polysilane derivatives have been prepared by the condensation of a number of α,ω-dichloropolysilanes with some aromatic bis silanols. In this manner, polymers containing polysilane blocks of 2, 4, or 6 catenated silicon atoms have been prepared. The materials are thermally stable and the UV spectroscopic properties mimic those of the corresponding monomers. Although these materials bleach upon irradiation in the deep UV, surprisingly, the block interrupt polysilanes behave as negative resists upon exposure to 254 nm radiation. This behavior contrasts with that of standard polysilane homopolymers which usually function in a positive lithographic mode. |
