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Step formation on hydrogen-etched 6H-SiC{0 0 0 1} surfaces
Authors:S Nie  CD Lee  RM Feenstra  Y Ke  RP Devaty  WJ Choyke  CK Inoki  TS Kuan  Gong Gu
Institution:aDepartment of Physics, Carnegie Mellon University, Pittsburgh, PA 15213, USA;bDepartment of Physics and Astronomy, University of Pittsburgh, Pittsburgh, PA 15260, USA;cDepartment of Physics, University at Albany, SUNY, Albany, NY 12222, USA;dSarnoff Corporation, CN5300, Princeton, NJ 08543, USA
Abstract:The formation of step bunches and/or facets on hydrogen-etched 6H-SiC(0 0 0 1) and (View the MathML source) surfaces has been studied, using both nominally on-axis and intentionally miscut (i.e. vicinal) substrates. It is found that small miscuts on the (0 0 0 1) surface produce full unit-cell high steps, while half unit-cell high steps are observed on the (View the MathML source) surface. The observed step normal direction is found to be View the MathML source for both surfaces. Hence, for intentionally miscut material, a miscut oriented towards this direction produces much better order in the step array compared to a miscut oriented towards a View the MathML source direction. For (0 0 0 1) vicinal surfaces that are miscut towards the View the MathML source direction, the formation of surface ripples is observed for 3° miscut and the development of small facets (nanofacets) is found for higher miscut angles. Much less faceting is observed on miscut (View the MathML source) surfaces. Additionally, the (0 0 01) surface is found to have a much larger spatial anisotropy in step energies than the (View the MathML source) surface.
Keywords:Atomic force microscopy  Step formation and bunching  Silicon carbide
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