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硅功率集成技术发展动态
引用本文:胡刚毅,谭开洲,刘玉奎,张正璠,李开成,江军,胡永贵. 硅功率集成技术发展动态[J]. 微电子学, 2004, 34(2): 101-105
作者姓名:胡刚毅  谭开洲  刘玉奎  张正璠  李开成  江军  胡永贵
作者单位:模拟集成电路国家重点实验室,中国电子科技集团公司第二十四研究所,重庆 400060
摘    要:文章介绍了硅功率集成电路技术的一些发展劝态。单片中小功率智能集成电路发展迅速,以BCD为其主要工艺技术;基于SOI的智能功率集成电路也得到开发。单片集成式的功率管为电源管理小型化、高频、较高可靠性设计提供了新途径,它们在分布式电源、便携式设备仪表中得到广泛应用。

关 键 词:硅功率集成电路 BCD SOI 高压集成电路 电源管理
文章编号:1004-3365(2004)02-0101-05

Latest Development of Silicon-Based Power Integrated Circuit Technology
HU Gang-yi,TAN Kai-zhou,LIU Yu-kui,ZHANG Zheng-fan,LI Kai-cheng,JIANG Jun,HU Yong-gui. Latest Development of Silicon-Based Power Integrated Circuit Technology[J]. Microelectronics, 2004, 34(2): 101-105
Authors:HU Gang-yi  TAN Kai-zhou  LIU Yu-kui  ZHANG Zheng-fan  LI Kai-cheng  JIANG Jun  HU Yong-gui
Abstract:The latest development of Si-based power IC technology is summarized. Great progress has been made in medium- and small-scale monolithic smart power IC's based on BCD process technology. Smart power IC's based on SOI are also developed. The monolithic integrated power device provides a new approach to minimizing power management systems with high frequency and high reliability, which can find wide applications in distributed power supplies and portable equipments and instruments.
Keywords:High-voltage IC  Power IC  BCD process  Power management
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