Technological sources of charged particles with plasma emitters

At present, ion and electron beams, extensively used in industry, usually have a small cross section. Presented are generators of ion and electron flows with a large cross section using plasma emitters. These devices have a wide range of currents and voltages and are designed for metallurgical treatment and microelectronics. The author discusses a technological source of ions based on the vacuum-arc excited by a constricted discharge electron-beam installation with a large cross-section beam for microelectronics technology, a high-power electron-energy complex for heat treatment of manufactured articles and a generator of a low-energy, high-current electron beam with a plasma anode