亚微米并行激光直写系统的建模及仿真研究

提出了一种基于强度调制型空间光调制器（SLM）的并行激光直写系统，建立了该系统的数学模型，并以闪耀光栅的制作为例，给出了该并行激光直写系统的仿真分析结果。研究表明，该系统可实现的最小特征尺寸达到亚μm级，采用逐个图形进行曝光的方式使其具有内在的并行特性，可大大提高激光直写的速度；该系统所制作的二元光学器件类似连续轮廓器件，理论上可达到80%以上的衍射效率。

Modeling and Simulating Research on Sub-micron Parallel Laser Direct Writing Systems

An innovative parallel laser direct writing system based on intensity modulating spatial light modulator(SLM) is proposed,and the math model about this system is established.The simulated results about this system are given in the condition of taking manufacturing blazed grating as example.The investigation shows that this novel system can fabricate binary optical elements with sub micron minimum feature size,and has intrinsic parallel characteristic owing to its stepper exposure mode,therefore it can improve the writing velocity at large.The binary optical elements fabricated by using this system are similar to continuous profile elements,and more than 80 % diffraction efficiency is achieved.