| VHF-PECVD制备微晶硅薄膜的微结构研究 |
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| 引用本文： | 张丽伟,余泽通,杨根,卢景霄. VHF-PECVD制备微晶硅薄膜的微结构研究[J]. 人工晶体学报, 2009, 38(1): 231-234 |
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| 作者姓名： | 张丽伟 余泽通 杨根 卢景霄 |
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| 作者单位： | 新乡学院,新乡,453003;郑州大学物理工程学院材料物理教育部重点实验室,郑州,450052;河南科技学院机电学院,新乡,453003;郑州大学物理工程学院材料物理教育部重点实验室,郑州,450052 |
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| 基金项目： | 河南省教育厅自然科学基金 |
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| 摘 要： | 用甚高频等离子体化学气相沉积(VHF-PECVD)法在玻璃衬底上低温制备了不同沉积时间微晶硅薄膜.用拉曼散射光谱仪、X射线衍射(XRD)、原子力显微镜(AFM)等表征手段对薄膜的微观结构进行了研究.研究结果表明:随着沉积时间的延长,薄膜呈岛状生长,薄膜晶粒度在微晶核形成后迅速升高并逐渐饱和;其微观结构经历了"非晶相→非晶/微晶混合相→微晶相"的演变过程.本实验制备的微薄膜仍以(111)为优化取向.
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| 关 键 词： | 微晶硅薄膜 微观结构 微观形貌, |
Study on the Microstructure of Microcrystalline Silicon Thin Films by VHF-PECVD |
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| ZHANG Li-wei,YU Ze-tong,YANG Gen,LU Jing-xiao. Study on the Microstructure of Microcrystalline Silicon Thin Films by VHF-PECVD[J]. Journal of Synthetic Crystals, 2009, 38(1): 231-234 |
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| Authors: | ZHANG Li-wei YU Ze-tong YANG Gen LU Jing-xiao |
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| Affiliation: | 1.Xinxiang University;Xinxiang 453003;China;2.School of Mechanical and Electronics;Henan Institute of Science and Technology;3.Key Laboratory of Material Physics of Ministry of Education;School of Physical Engineering;Zhengzhou University;Zhengzhou 450052;China |
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| Abstract: | Microcrystalline silicon thin films were prepared on glass by very high frequency plasma enhanced chemical vapor deposition(VHF-PECVD) at different depositing time under low temperature.Raman,XRD and AFM were used to characterize the microstructure of the thin films.The result shows that with the lasting of deposition time,the silicon thin films fabricate in island shape.And the crystalline volume ratio of the films increased rapidly after the nucleation of the crystallites,and saturated gradually in the en... |
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| Keywords: | microcrystalline silicon thin film microstructure micromorphology |
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