| N2流量对GaN的形貌及光学和电学性能的影响 |
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| 引用本文： | 翟化松,王坤鹏,余春燕,翟光美,董海亮,许并社. N2流量对GaN的形貌及光学和电学性能的影响[J]. 无机化学学报, 2013, 29(18) |
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| 作者姓名： | 翟化松 王坤鹏 余春燕 翟光美 董海亮 许并社 |
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| 作者单位： | 太原理工大学新材料界面科学与工程教育部重点实验室, 太原 030024;山西省新材料工程技术研究中心, 太原 030024;太原理工大学材料科学与工程学院, 太原 030024;太原理工大学新材料界面科学与工程教育部重点实验室, 太原 030024;山西省新材料工程技术研究中心, 太原 030024;太原理工大学材料科学与工程学院, 太原 030024;太原理工大学新材料界面科学与工程教育部重点实验室, 太原 030024;山西省新材料工程技术研究中心, 太原 030024;太原理工大学材料科学与工程学院, 太原 030024;太原理工大学新材料界面科学与工程教育部重点实验室, 太原 030024;山西省新材料工程技术研究中心, 太原 030024;太原理工大学材料科学与工程学院, 太原 030024;太原理工大学新材料界面科学与工程教育部重点实验室, 太原 030024;山西省新材料工程技术研究中心, 太原 030024;太原理工大学材料科学与工程学院, 太原 030024;太原理工大学新材料界面科学与工程教育部重点实验室, 太原 030024;山西省新材料工程技术研究中心, 太原 030024;太原理工大学材料科学与工程学院, 太原 030024 |
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| 基金项目： | 国家自然科学基金(No.51002102)和山西省回国留学人员重点科研(2009-03)资助项目。 |
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| 摘 要： | 采用化学气相沉积法(CVD)在Si(100)衬底上以Ni为催化剂, 金属Ga和NH3为原料合成了GaN微纳米结构, 并研究了N2流量对产物GaN的形貌及光学和电学性能的影响。利用场发射扫描电子显微镜(SEM)、透射电镜(TEM)、X射线衍射仪(XRD)、X-ray能谱仪(EDS)、光致发光谱(PL)和霍尔效应测试仪(HMS-3000)等测试手段对样品的形貌、结构、成分、光学和电学性能进行了分析。结果表明, 随着N2流量的增加, 产物GaN的形貌发生了由微米棒到蠕虫状线再到光滑纳米线的转变;生成的GaN均为六方纤锌矿结构;样品均表现出383 nm的近带边紫外发射峰和470 nm左右的蓝光发射峰;所有样品均为n型;并对产物GaN的形貌转变机理进行了分析。
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| 关 键 词： | N2流量 GaN微米棒 蠕虫状GaN GaN纳米线 化学气相沉积 |
| 修稿时间： | 2013-06-06 |
Effect of N2 Flow Rate on Morphology, Optical and Electrical Properties of GaN |
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| ZHAI Hua-Song,WANG Kun-Peng,YU Chun-Yan,ZHAI Guang-Mei,DONG Hai-Liang and XU Bing-She. Effect of N2 Flow Rate on Morphology, Optical and Electrical Properties of GaN[J]. Chinese Journal of Inorganic Chemistry, 2013, 29(18) |
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| Authors: | ZHAI Hua-Song WANG Kun-Peng YU Chun-Yan ZHAI Guang-Mei DONG Hai-Liang XU Bing-She |
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| Affiliation: | Key Laboratory of Interface Science and Engineering in Advanced Materials (Taiyuan University of Technology), Ministry of Education, Taiyuan 030024, China;Shanxi Research Center of advanced Materials Science and Technology, Taiyuan 030024, China;College of Material Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, China;Key Laboratory of Interface Science and Engineering in Advanced Materials (Taiyuan University of Technology), Ministry of Education, Taiyuan 030024, China;Shanxi Research Center of advanced Materials Science and Technology, Taiyuan 030024, China;College of Material Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, China;Key Laboratory of Interface Science and Engineering in Advanced Materials (Taiyuan University of Technology), Ministry of Education, Taiyuan 030024, China;Shanxi Research Center of advanced Materials Science and Technology, Taiyuan 030024, China;College of Material Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, China;Key Laboratory of Interface Science and Engineering in Advanced Materials (Taiyuan University of Technology), Ministry of Education, Taiyuan 030024, China;Shanxi Research Center of advanced Materials Science and Technology, Taiyuan 030024, China;College of Material Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, China;Key Laboratory of Interface Science and Engineering in Advanced Materials (Taiyuan University of Technology), Ministry of Education, Taiyuan 030024, China;Shanxi Research Center of advanced Materials Science and Technology, Taiyuan 030024, China;College of Material Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, China;Key Laboratory of Interface Science and Engineering in Advanced Materials (Taiyuan University of Technology), Ministry of Education, Taiyuan 030024, China;Shanxi Research Center of advanced Materials Science and Technology, Taiyuan 030024, China;College of Material Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, China |
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| Abstract: | GaN micro/nanostructures were synthesized by chemical vapor deposition method (CVD) on Si (100) substrate with catalyst Ni, Ga and NH3 as raw materials. Effect of N2 flow rate on the morphology as well as optical and electrical properties of GaN were researched. The morphology, structure, composition, optical and electrical properties were characterized by Field emission scanning electron microscopy (SEM), Transmission electron microscopy(TEM), X-ray diffraction (XRD), Energy dispersive X-ray spectroscopy (EDS), Photoluminescence (PL) and Hall effect measurement system (HMS-3000). The results indicate that with the increase of N2 flow rate, the morphology of GaN evolved from microrods to vermicular-like wires and then to smooth nanowires. All samples are hexagonal wurtzite, and show near-band-edge UV emission peaks of 383nm and blue light emission peaks of about 470 nm. Hall test results show that all samples are n-type. Furthermore, the morphology evolution mechanisms of GaN are analyzed. |
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| Keywords: | N2 flow rate GaN microrods vermicular-like GaN GaN nanowires CVD |
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