| 用时间-边界跟踪模型确定抗蚀剂显影后的轮廓分布 |
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| 引用本文： | 范建兴,冯伯儒.用时间-边界跟踪模型确定抗蚀剂显影后的轮廓分布[J].光子学报,1997,26(6):546-549. |
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| 作者姓名： | 范建兴 冯伯儒 |
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| 作者单位： | 中国科学院光电技术研究所!成都，610209，中国科学院光电技术研究所!成都，610209，中国科学院光电技术研究所!成都，610209 |
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| 摘 要： | 文章提出了时间一边界跟踪模型的定义,阐述了用该模型确定抗蚀剂显影后的轮廓分布的方法,并给出了模拟计算结果.
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| 关 键 词： | 抗蚀剂显影 抗蚀剂轮廓 计算机模拟 |
| 收稿时间： | 1996-08-07 |
DETERMINATION OF RESIST PROFILE AFTER DEVELOPMENT WITH MODEL OF TIME-EDGE TRACKING |
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| Fan Jianxing,Feng Born,Zhang Jing.DETERMINATION OF RESIST PROFILE AFTER DEVELOPMENT WITH MODEL OF TIME-EDGE TRACKING[J].Acta Photonica Sinica,1997,26(6):546-549. |
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| Authors: | Fan Jianxing Feng Born Zhang Jing |
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| Institution: | Institufe of Optics &; Electronics, Chinese Academy of Sciences, Chengdu 610209 |
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| Abstract: | In the paper the definition of the model of time-edge tracking is presented. A method ofdetermination of the resist profile after development with the model is described. The simulation andcalculation results are given. |
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| Keywords: | Resist development Resist profile Computer simulation |
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