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Theoretical study of electron mobility for silicon-carbon alloys |
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| Authors: | ST Chang CY Lin |
| Institution: | a Department of Electrical Engineering, National Chung Hsing University, Taichung, Taiwan, ROC b Department of Physics, National Chung Hsing University, Taichung, Taiwan, ROC c Department of Electronic Engineering, ChungChou Institute of Technology, Taiwan, ROC |
| Abstract: | Electron mobilities in strained Si1−xCx layers grown on a Si substrate and relaxed alloys are calculated as functions of carbon content, alloy scattering potential, and doping concentration at room temperature. The electron mobility model is backed by experimental data. In the case of doped strained Si1−xCx, the results of our electron mobility model indicates that for systems with a doping concentration greater than 1018 cm−3, there is no substantial decrease in the in-plane mobility with an increase in the carbon mole fraction. However, for low doping concentrations, the mobility decreases with a decrease in the carbon mole fraction. |
| Keywords: | Silicon-carbon alloy Mobility Alloy scattering Impurity scattering Strain |
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