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X-ray photoelectron and Raman studies of microwave Plasma Assisted Chemical Vapour Deposition (PACVD) diamond films
Authors:Bernard Humbert,Nesrine Hellala,Silvè  re Barrat
Affiliation:a Laboratoire de Chimie Physique et Microbiologie pour l’Environnement, LCPME, UMR 7564 CNRS, Nancy-Université, 405, rue de Vandoeuvre, 54600 Villers lès Nancy, France
b Laboratoire de Science et Génie des Surfaces, UMR 7560, Nancy-Université, CNRS, Parc de Saurupt, CS 14234, F-54042 Nancy Cedex, France
Abstract:X-ray photoelectron and Raman spectroscopies were used to investigate the chemical and the structural properties of thin diamond films synthesised by Plasma Assisted Chemical Vapour Deposition (PACVD). Continuous polycrystalline diamond films were grown under different plasma conditions and based on the combination of detailed XPS and Raman spectroscopic analysis two main topics are highlighted (i) the stress measurements were discussed by distinguishing clearly the chemical effects from the mechanical effects; (ii) an electronic gap at 2.7 eV probed by Raman resonance that corresponds to an energy loss peak on the XPS carbon signal, was related to the surface hydrogenation.
Keywords:Diamond films   XPS   Raman   Internal stresses   Chemical vapour deposition   Diamond   X-ray spectroscopy   Raman spectroscopy   Stress measurements   Coatings
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