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Self-assembled film thickness determination by focused ion beam
Authors:J Dejeu  R Salut  F Membrey  D Charraut
Institution:a Institut UTINAM, UMR 6213 CNRS-UFC - équipe Materiaux et Surfaces Structurés, Université de Franche-Comte, UFR Sciences et Techniques, 16 route de Gray - 25030 Besancon Cedex, France
b Institut FEMTO-ST, UMR 6174 CNRS-UFC-UTBM-ENSMM, Centrale MIMENTO, Université de Franche-Comte, 32 avenue de l’Observatoire - 25044 Besançon Cedex, France
c Institut FEMTO-ST, UMR 6174 CNRS-UFC-UTBM-ENSMM, Département d’Optique, Université de Franche-Comté, UFR Sciences et Techniques, 16 route de Gray - 25030 Besançon Cedex, France
Abstract:The thickness evolution of multilayer film is investigated by focused ion beam (FIB) in the domain of polymer multilayers. This method, currently used in the modification and the characterization of integrated circuits, proves it is possible to determine the polymer film thickness. Sample cutting and its observation of the cross-section are performed in the FIB without leaving the vacuum chamber. Two main conclusions can be drawn: (1) the roughness of the film increases with the number of layer deposit, (2) the film growth changes from nonlinear (called exponential) to linear beyond 300 nm (70 layers).
Keywords:82  35  Rs  81  16  Dn  68  65  Ac  68  43  Hn  68  55  Jk  68  49  Sf
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