Characterization of soft-X-ray detectors fabricated with high-quality CVD diamond thin films |
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Authors: | Y. Iwakaji O. Maida Y. Saitoh |
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Affiliation: | a Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan b JAEA/SPring-8, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan |
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Abstract: | We have characterized the performance of soft-X-ray detectors fabricated with undoped and B-doped homoepitaxial diamond layers of high quality which were grown on a commercially available type Ib (1 0 0) substrate by means of a high-power microwave-plasma chemical-vapor-deposition (CVD) method. The signal currents of the diamond-based detectors with thin TiN electrodes formed vertically (along the homoepitaxial growth direction) were measured at room temperature as a function of the applied voltage, Va, for irradiations of 500-1200 eV soft-X-ray beams ranging from ≈6 × 109 to ≈1 × 1011 photons/s. The deduced apparent quantum efficiencies increased with the increasing Va and reached to 2.5 × 103 at Va = 60 V. As expected from the device structure, the detector performance depended only very slightly on the applied magnetic field up to 10 T. The excellently high sensitivities attained for soft-X-ray photons are discussed in relation to carrier amplification mechanisms which invested the above diamond detectors. |
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Keywords: | 73.61.&minus r 81.05.Uw 81.15.Gh |
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