A Disilene Base Adduct with a Dative Si–Si Single Bond |
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| Authors: | Julia I. Schweizer Dr. Markus G. Scheibel Dr. Martin Diefenbach Felix Neumeyer Dr. Christian Würtele Dr. Natalia Kulminskaya Dr. Rasmus Linser Prof. Dr. Norbert Auner Prof. Dr. Sven Schneider Prof. Dr. Max C. Holthausen |
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| Affiliation: | 1. Institut für Anorganische Chemie, Goethe-Universit?t, Frankfurt/Main, Germany;2. Institut für Anorganische Chemie, Georg-August-Universit?t, G?ttingen, Germany;3. Department NMR-Based Structural Biology, Max-Planck Institute for Biophysical Chemistry, G?ttingen, Germany |
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| Abstract: | An experimental and theoretical study of the base‐stabilized disilene 1 is reported, which forms at low temperatures in the disproportionation reaction of Si2Cl6 or neo‐Si5Cl12 with equimolar amounts of NMe2Et. Single‐crystal X‐ray diffraction and quantum‐chemical bonding analysis disclose an unprecedented structure in silicon chemistry featuring a dative Si→Si single bond between two silylene moieties, Me2EtN→SiCl2→Si(SiCl3)2. The central ambiphilic SiCl2 group is linked by dative bonds to the amine donor and the bis(trichlorosilyl)silylene acceptor, which leads to push–pull stabilization. Based on experimental and theoretical examinations a formation mechanism is presented that involves an autocatalytic reaction of the intermediately formed anion Si(SiCl3)3? with neo‐Si5Cl12 to yield 1 . |
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| Keywords: | bonding analysis dative bonds disilenes silylenes X-ray diffraction |
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