| TiO_x层在Pt/Ti电极中对Ti扩散的抑制作用 |
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| 引用本文： | 张柏顺,何军,章天金.TiO_x层在Pt/Ti电极中对Ti扩散的抑制作用[J].电子元件与材料,2006,25(3):24-26. |
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| 作者姓名： | 张柏顺 何军 章天金 |
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| 作者单位： | 湖北大学物理学与电子技术学院,湖北,武汉,430062 |
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| 摘 要： | 采用直流磁控溅射方法在SiO2/Si衬底上制备出Pt/Ti和Pt/TiOx底电极。用XRD分析其晶相结构,用AFM测量其晶粒尺寸和表面粗糙度。结果表明,用TiOx层代替金属Ti后,能有效地抑制在高温环境下Ti原子向Pt层扩散,使电极表面粗糙度减小(粗糙度为2.99 nm)。
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| 关 键 词： | 电子技术 铁电薄膜 Pt/Ti电极 粗糙度 Ti扩散 |
| 文章编号： | 1001-2028（2006）03-0024-03 |
| 收稿时间： | 2005-10-30 |
| 修稿时间： | 2005-10-30 |
Control of the Ti Out-diffusion in Pt/Ti Bottom Electrode for Ferroelectric Thin Film |
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| ZHANG Bai-shun,HE Jun,ZHANG Tian-jin.Control of the Ti Out-diffusion in Pt/Ti Bottom Electrode for Ferroelectric Thin Film[J].Electronic Components & Materials,2006,25(3):24-26. |
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| Authors: | ZHANG Bai-shun HE Jun ZHANG Tian-jin |
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| Institution: | School of Physics and Electronic Technology, Huhei University, Wuhan 430062. China |
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| Abstract: | Pt/Ti and Pt/TiOx bottom electrodes were prepared on SiO2/Si substrate by DC-sputtering method.The X-ray measurements allowed us to get the crystal orientation and microstructure of the Pt electrodes.The size of grain and roughness of Pt/Ti or Pt/TiOx bottom electrodes caused by Ti out-diffusion before and after RTA treatment were observed by AFM.The results show that the roughness of Pt/Ti bottom electrode increases much higher and hillocks are formed after high temperature treatment,However,the surface of Pt/TiOx bottom electrode keeps quite flat(roughness is 2.99 nm). |
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| Keywords: | electronic technology ferroelectric tnin film Pt/Ti electrode roughness Ti out-diffusion |
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