A15Nb3Si produced by high-pressure annealing of amorphous sputter deposits |
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| Authors: | H. Iwasaki W.K. Wang N. Toyota T. Fukase H. Fujimori Y. Akahama S. Endo |
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| Affiliation: | The Research Institute for Iron, Steel and Other Metals, Tohoku University, Sendai 980, Japan;High Pressure Research Laboratory, Faculty of Engineering Science, Osaka University, Toyonaka 560, Japan |
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| Abstract: | A high-pressure annealing technique has been used to convert an amorphous Nb-23.7 at.% Si alloy, prepared by sputtering, into the A15 phase alloy. X-ray diffraction examination of the alloy samples quenched to ambient conditions has shown that they are in an almost single-phased state with a lattice parameter of 0.5120 nm and a high degree of atomic ordering. An onset of superconductivity has been detected at 8.9 K and a temperature derivative of upper critical field is 14 kOe/K (MA/4π mK). |
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| Keywords: | To whom all the correspondence should be addressed. |
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