Fabrication of optical waveguide devices using gas‐assisted UV micro/nanoimprinting with soft mold |
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| Authors: | Y.‐J. Weng Y.‐C. Weng S.‐Y. Yang L. A. Wang |
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| Affiliation: | 1. Department of Mechanical Engineering, National Taiwan University, Taipei 106, Taiwan, Republic of ChinaDepartment of Mechanical Engineering, National Taiwan University, Taipei 106, Taiwan, Republic of China.;2. Department of Mechanical Engineering, National Taiwan University, Taipei 106, Taiwan, Republic of China;3. Institute of Electro‐Optical Engineering, National Taiwan University, Taipei 106, Taiwan, Republic of China |
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| Abstract: | Wavelength limitation and diffraction of light are the bottlenecks encountered in the production of structures by conventional lithography. Nano‐imprinting has been a potential process for mass production of nanometer structures at low cost. This paper reports an innovative process to replicate the ridge‐shaped microstructures on the silicon mold onto the photoresist using gas‐assisted pressing mechanism and soft mold. The microstructures on the silicon mold are replicated unto PC films. The soft mold is obtained by casting the PDMS with the PC film as templates, PDMS mold and UV‐curable photoresist are brought into contact, and are pressurized by gas and cured by UV‐light at the same time. After curing, structures for optical wave guilding can be obtained, In this process, through the control of gas pressure, the residual layer of the ridge‐shaped component for light guilding can eliminated. Etching is no longer needed to get rid of the residual layer. This process is effective for mass production for replication of microstructures at low cost. Copyright © 2007 John Wiley & Sons, Ltd. |
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| Keywords: | PDMS soft mold gas‐imprint nano‐imprinting UV‐curable photoresist ridge waveguides |
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