Focused ion beam micromachining and computation of polymeric photonic band gap |
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| Authors: | E. Pialat T. Trigaud J. P. Moliton M. Thévenot |
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| Affiliation: | 1. Université de Limoges, Facultés des Sciences et Techniques CNRS, UMR 6172, Institut de Recherche XLIM, Département MINACOM, 123, Avenue Albert Thomas, 87060 Limoges Cedex, FranceUniversité de Limoges, Facultés des Sciences et Techniques CNRS, UMR 6172, Institut de Recherche XLIM, Département MINACOM, 123, Avenue Albert Thomas, 87060 Limoges Cedex, France;2. Université de Limoges, Facultés des Sciences et Techniques CNRS, UMR 6172, Institut de Recherche XLIM, Département MINACOM, 123, Avenue Albert Thomas, 87060 Limoges Cedex, France |
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| Abstract: | This article introduces a new approach to the achievement of low cost devices for optical telecommunications. For this purpose, the implementation of polymer components and of the WDM method show several advantages. A polymeric photonic band gap lattice can effectively assume demultiplexing at the wavelength of 1.55 μm without energy dissipation. First, the computation of the geometrical parameters designing a polymer photonic crystal by means of the finite‐difference‐time‐domain method, implemented with Bloch functions, is presented here. Second, the achievement of 2D polymer lattices by a dry process, the focused ion beam milling, is exposed. The experimental conditions for the achievement of a master are discussed on the basis of the milling performances and of the polymers physical properties. © 2007 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 45: 2993–3002, 2007 |
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| Keywords: | ion beam photonic band gap (PBG) polymer etching |
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