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InGaAs Photodetectors Cut-off at 1.9μm Grown by Gas-Source Molecular Beam Epitaxy
引用本文:张永刚,郝国强,顾溢,朱诚,李爱珍,刘天东.InGaAs Photodetectors Cut-off at 1.9μm Grown by Gas-Source Molecular Beam Epitaxy[J].中国物理快报,2005,22(1):250-253.
作者姓名:张永刚  郝国强  顾溢  朱诚  李爱珍  刘天东
作者单位:StateKeyLaboratoryofFunctionalMaterialsforInformatics,ShanghaiInstituteofMicrosystemandInformationTechnology,ChineseAcademyofSciences,Shanghai200050
摘    要:Using a linear graded Inx Ga1-xAs as the buffer layer, positive-intrinsic-negative wavelength-extended In0.6 Ga0.4As photodetectors with 50% cut-off wavelength of 1.9μm at room temperature were grown by using gas-source molecular beam epitaxy, and their performance over a wide temperature range has been extensively investigated. The detectors show typical dark current at bias voltage 50mV and the resistance-area product R0A of 7nA/765Ωcm^2 and 31pA/404kΩcm^2 at 290K and 210K, respectively. The thermal activation energy of the dark current in the temperature range 250-350K is 0.488 eV.

关 键 词:InGaAs  光电探测器  气体源  分子束  晶体外延附生
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