Low-frequency noise characteristics of InGaAs quantum-dot infrared photodetector structures grown by atomic layer molecular-beam epitaxy |
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Authors: | WJ Choi JD Song SH Hwang JI Lee JH Kim JI Song EK Kim A Chovet |
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Institution: | aNano Device Research Center, KIST, Seoul 136-791, Republic of Korea;bDepartment Information and Communications, K-JIST, Gwangju 506-303, Republic of Korea;cDepartment of Physics, Hanyang University, Seoul 133-791, Republic of Korea;dIMEP, ENSERG, CNRS/INPG, 38016 Grenoble, France |
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Abstract: | Optical and electrical characteristics of n–i–n InGaAs/GaAs quantum-dot (QD) infrared photodetectors are reported. In particular, the low-frequency excess electrical noise is measured at room temperature and analyzed in conjunction with the optical properties of the structure. The three stackings of QD were formed by atomic layer molecular-beam epitaxy and highly Si-doped, and AlGaAs current-blocking layer was also included to reduce the dark current. The power-dependent photoluminescence (PL) spectra at 300 K indicates that there are at least three confined states in the QD. The photo-current was observed only at low temperatures (10 K) at wavelengths between 3 and 9 μm with three peaks. The dark current was relatively large and asymmetric at low temperatures. At room temperature the dark current was symmetric and ohmic. The 1/f-like low-frequency noise spectral density exhibited an almost quadratic current dependence giving a large value of the Hooge parameter of the order of unity. The relatively low-growth temperature for the AlGaAs current blocking layer and the high doping at the quantum dots seem to generate a considerable amount of defects and result in low-temperature photodetection and a large low-frequency noise density. |
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Keywords: | InGaAs GaAs Quantum dots QDIP Low-frequency noise Hooge parameter |
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