首页 | 本学科首页   官方微博 | 高级检索  
     

Structural and mechanical properties of Al–C–N films deposited at room temperature by plasma focus device
引用本文:Z A Umar,R Ahmad,R S Rawat,M A Baig,J Siddiqui,T Hussain. Structural and mechanical properties of Al–C–N films deposited at room temperature by plasma focus device[J]. 中国物理 B, 2016, 25(7): 75201-075201. DOI: 10.1088/1674-1056/25/7/075201
作者姓名:Z A Umar  R Ahmad  R S Rawat  M A Baig  J Siddiqui  T Hussain
作者单位:1.National Centre for Physics, Quaid-i-Azam University Campus, Islamabad, 54320 Pakistan;2.Department of Physics, GC University, Lahore 54000, Pakistan;3.NSSE, National Institute of Education, Nanyang Technological University, Singapore 637616, Singapore;4.Centre for Advanced Studies in Physics, GC University, Lahore 54000, Pakistan
摘    要:The Al–C–N films are deposited on Si substrates by using a dense plasma focus(DPF) device with aluminum fitted central electrode(anode) and by operating the device with CH_4/N_2 gas admixture ratio of 1:1. XRD results verify the crystalline Al N(111) and Al_3CON(110) phase formation of the films deposited using multiple shots. The elemental compositions as well as chemical states of the deposited Al–C–N films are studied using XPS analysis, which affirm Al–N, C–C, and C–N bonding. The FESEM analysis reveals that the deposited films are composed of nanoparticles and nanoparticle agglomerates. The size of the agglomerates increases at a higher number of focus deposition shots for multiple shot depositions. Nanoindentation results reveal the variation in mechanical properties(nanohardness and elastic modulus)of Al–C–N films deposited with multiple shots. The highest values of nanohardness and elastic modulus are found to be about 11 and 185 GPa, respectively, for the film deposited with 30 focus deposition shots. The mechanical properties of the films deposited using multiple shots are related to the Al content and C–N bonding.

收稿时间:2016-01-08

Structural and mechanical properties of Al-C-N films deposited at room temperature by plasma focus device
Z A Umar,R Ahmad,R S Rawat,M A Baig,J Siddiqui,T Hussain. Structural and mechanical properties of Al-C-N films deposited at room temperature by plasma focus device[J]. Chinese Physics B, 2016, 25(7): 75201-075201. DOI: 10.1088/1674-1056/25/7/075201
Authors:Z A Umar  R Ahmad  R S Rawat  M A Baig  J Siddiqui  T Hussain
Affiliation:1.National Centre for Physics, Quaid-i-Azam University Campus, Islamabad, 54320 Pakistan;2.Department of Physics, GC University, Lahore 54000, Pakistan;3.NSSE, National Institute of Education, Nanyang Technological University, Singapore 637616, Singapore;4.Centre for Advanced Studies in Physics, GC University, Lahore 54000, Pakistan
Abstract:The Al-C-N films are deposited on Si substrates by using a dense plasma focus (DPF) device with aluminum fitted central electrode (anode) and by operating the device with CH4/N2 gas admixture ratio of 1:1. XRD results verify the crystalline AlN (111) and Al3CON (110) phase formation of the films deposited using multiple shots. The elemental compositions as well as chemical states of the deposited Al-C-N films are studied using XPS analysis, which affirm Al-N, C-C, and C-N bonding. The FESEM analysis reveals that the deposited films are composed of nanoparticles and nanoparticle agglomerates. The size of the agglomerates increases at a higher number of focus deposition shots for multiple shot depositions. Nanoindentation results reveal the variation in mechanical properties (nanohardness and elastic modulus) of Al-C-N films deposited with multiple shots. The highest values of nanohardness and elastic modulus are found to be about 11 and 185 GPa, respectively, for the film deposited with 30 focus deposition shots. The mechanical properties of the films deposited using multiple shots are related to the Al content and C-N bonding.
Keywords:dense plasma focus  XPS  field emission scanning electron microscope  elastic modulus  
本文献已被 CNKI 等数据库收录!
点击此处可从《中国物理 B》浏览原始摘要信息
点击此处可从《中国物理 B》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号