| A nano-scale mirror-like surface of Ti–6Al–4V attained by chemical mechanical polishing |
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| 引用本文： | 梁晨亮,刘卫丽,李沙沙,孔慧,张泽芳,宋志棠. A nano-scale mirror-like surface of Ti–6Al–4V attained by chemical mechanical polishing[J]. 中国物理 B, 2016, 25(5): 58301-058301. DOI: 10.1088/1674-1056/25/5/058301 |
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| 作者姓名： | 梁晨亮 刘卫丽 李沙沙 孔慧 张泽芳 宋志棠 |
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| 作者单位： | 1. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;2. University of the Chinese Academy of Sciences, Beijing 100049, China |
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| 基金项目： | Project supported by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period of China (Grant No. 2009ZX02030-1), the National Natural Science Foundation of China (Grant No. 51205387), the Support by Science and Technology Commission of Shanghai City, China (Grant No. 11nm0500300), and the Science and Technology Commission of Shanghai City, China (Grant No. 14XD1425300). |
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| 摘 要： | Metal Ti and its alloys have been widely utilized in the fields of aviation, medical science, and micro-electromechanical systems, for its excellent specific strength, resistance to corrosion, and biological compatibility. As the application of Ti moves to the micro or nano scale, however, traditional methods of planarization have shown their short slabs.Thus, we introduce the method of chemical mechanical polishing(CMP) to provide a new way for the nano-scale planarization method of Ti alloys. We obtain a mirror-like surface, whose flatness is of nano-scale, via the CMP method. We test the basic mechanical behavior of Ti–6Al–4V(Ti64) in the CMP process, and optimize the composition of CMP slurry.Furthermore, the possible reactions that may take place in the CMP process have been studied by electrochemical methods combined with x-ray photoelectron spectroscopy(XPS). An equivalent circuit has been built to interpret the dynamic of oxidation. Finally, a model has been established to explain the synergy of chemical and mechanical effects in the CMP of Ti–6Al–4V.
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| 收稿时间： | 2015-11-23 |
A nano-scale mirror-like surface of Ti-6Al-4V attained by chemical mechanical polishing |
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| Affiliation: | 1. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;2. University of the Chinese Academy of Sciences, Beijing 100049, China |
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| Abstract: | Metal Ti and its alloys have been widely utilized in the fields of aviation, medical science, and micro-electro-mechanical systems, for its excellent specific strength, resistance to corrosion, and biological compatibility. As the application of Ti moves to the micro or nano scale, however, traditional methods of planarization have shown their short slabs. Thus, we introduce the method of chemical mechanical polishing (CMP) to provide a new way for the nano-scale planarization method of Ti alloys. We obtain a mirror-like surface, whose flatness is of nano-scale, via the CMP method. We test the basic mechanical behavior of Ti-6Al-4V (Ti64) in the CMP process, and optimize the composition of CMP slurry. Furthermore, the possible reactions that may take place in the CMP process have been studied by electrochemical methods combined with x-ray photoelectron spectroscopy (XPS). An equivalent circuit has been built to interpret the dynamic of oxidation. Finally, a model has been established to explain the synergy of chemical and mechanical effects in the CMP of Ti-6Al-4V. |
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| Keywords: | chemical mechanical polishing titanium electrochemical x-ray photoelectron spectroscopy (XPS) |
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