Modified model of gate leakage currents in AlGaN/GaN HEMTs |
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Affiliation: | National Key Laboratory of Application Specific Integrated Circuit (ASIC), Hebei Semiconductor Research Institute, Shijiazhuang 050051, China |
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Abstract: | It has been reported that the gate leakage currents are described by Frenkel-Poole emission (FPE) model, at the temperatures higher than 250 K. However, the gate leakage currents of our passivated devices do not accord with the FPE model. Therefore, a modified FPE model is developed in which an additional leakage current, besides the gate (III), is added. Based on the samples with different passivations, the III caused by a large number of surface traps is separated from total gate currents, and is found to be linear with respect to (φB-Vg)0.5. Compared with these from the FPE model, the calculated results from the modified model agree well with the Ig-Vg measurements at temperatures ranging from 295 K to 475 K. |
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Keywords: | gate leakage currents FPE model additional leakage current surface traps |
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