Frequency scanning interferometry immune to length drift using a pair of vertical-cavity surface-emitting laser diodes |
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Authors: | Seiichi Kakuma Yasuhiko Katase |
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Institution: | 1. Division of Applied Physics, Graduate School of Engineering, Hokkaido University, Sapporo, 060-8628, Japan
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Abstract: | In laser frequency scanning interferometry for measurements of absolute lengths, a small drift in the measured length during the frequency scan yields an enlarged offset error in the measured result. Although such an error is unavoidable for an on-site interferometric system, methods for solving this problem have not been developed. We propose a frequency scanning interferometric system immune to the dynamic length change employing a pair of vertical-cavity surface-emitting laser diodes whose frequencies are equally scanned in opposite directions. The offset error is canceled by averaging the two phase shifts of the interferograms obtained from the light sources. |
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