Atomic layer deposited TiOx/AlOx nanolaminates as moisture barriers for organic devices |
| |
Institution: | 1. Department of Chemical Engineering, Kyung Hee University, Yongin-si, Gyeonggi-do 446-701, Republic of Korea;2. Regional Innovation Center-Components and Materials for Information Display, Kyung Hee University, Yongin-si, Gyeonggi-do 446-701, Republic of Korea |
| |
Abstract: | Atomic layer deposited nanolaminates of alternating AlOx and TiOx thin-films are investigated as moisture barriers for organic electronic devices. Direct encapsulation on organic light emitting diodes (OLEDs) is tested in aging experiments and compared to calcium corrosion tests of equivalent barrier films. This allows for a direct assessment of moisture barrier performance in simple as well as more complex systems. Thickness variations are performed for the nanolaminate single and total layer thickness, with an optimum single layer thickness of 1–2 nm observed. This correlates to the maximum number of dyads once completely closed single layers are produced. For large single layer thickness and low dyad count, strong lateral diffusion from the edges occurs in the OLEDs, which likely correlates to poor mechanical stability. At optimum single layer thickness, barriers remain mechanically and chemically stable up to 100 nm total thickness. OLEDs encapsulated with such nanolaminate barriers show no significant degradation after 2500 h of continuous aging. |
| |
Keywords: | Moisture barrier Nanolaminate OLEDs Atomic layer deposition WVTR |
本文献已被 ScienceDirect 等数据库收录! |
|