High-speed microcontact printing |
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Authors: | Helmuth Jo A Schmid Heinz Stutz Richard Stemmer Andreas Wolf Heiko |
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Affiliation: | Nanotechnology Group, ETH Zurich, CH-8092 Zurich, Switzerland. |
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Abstract: | We have demonstrated microcontact printing (muCP) of self-assembled monolayers in the millisecond regime. The contact formation and separation of the stamp and substrate was studied with high-speed video recordings. Using high ink concentrations and contact times as short as 1 ms, we printed monolayers of hexadecanethiol on Au, which served as a selective etch resist. High-speed muCP yields defect-free monolayers that are independent of the dimensions of the printed patterns, have high contrast between printed and unprinted areas, and enable perfect reproducibility of prints. |
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