Hydrogen gas mixture separation by CVD silica membrane

In this work we investigate the performance of high flux chemical vapour deposition (CVD) silica membranes for the separation of gas mixtures containing H₂ and CO₂ at various temperatures. The membranes were prepared by a counter diffusion CVD method where tetraethyl orthosilicate (TEOS) and O₂ were used as reactants. Single gas permeation resulted in activated transport for the smaller kinetic diameter gases (H₂ and He) whilst the larger kinetic diameter gases (CO₂ and N₂) showed negative activation energy. The single gas permeation of H₂ increased from 5.1 × 10⁻⁷ to 7.0 × 10⁻⁷ mol m⁻² s⁻¹ Pa⁻¹ in the temperature range 100–400 °C, and H₂/CO₂ and H₂/N₂ selectivities reached 36 and 57 at 400 °C, respectively. The H₂ purity in the permeate stream also increased with temperature for H₂:CO₂ binary gas mixture, thus being beneficial for H₂ diffusion. H₂ competitively permeated through the membrane at a several range of gas mixtures, and a saturation level was achieved at H₂:CO₂ 60:40 feed concentration, where the diffusion of CO₂ molecules became negligible delivering ∼99% H₂ purity in the permeate stream. These results substantiate that the counter diffusion CVD method produced thin silica film membranes with a very precise pore size control, in particular suggesting a narrow pore distribution with average pore radius of about 3.1 Å.