Atom probe mass spectrometry |
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Authors: | A B Tolstoguzov |
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Institution: | 1.Centre for Physics and Technological Research, Dept. de Física da Faculdade de Ciências e Tecnologia (FCT),Universidade Nova de Lisboa,Caparica,Portugal |
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Abstract: | Round-robin characterization is reported on the sputter depth profiling of CrN/AlN multilayer thin-film coatings on nickel
alloy by secondary ion mass spectrometry (SIMS) and glow-discharge optical emission spectrometry (GD-OES). It is demonstrated
that a CAMECA SIMS 4550 Depth Profiler operated with 3 keV O2+ primary ions provides the best depth resolution and sensitivity. The key factor is sample rotation, which suppresses the
negative influence of the surface topography (initial and ion-induced) on the depth profile characteristics. |
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Keywords: | |
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