Depth profiling using secondary ion mass spectrometry and sample current measurements

The features of the method for measuring the total current in the sample circuit in combination with secondary ion mass spectrometry (SIMS) depth profiling of various thin-film structures are discussed in detail. The results on depth profiling of multilayer CrN/AlN coatings magnetron-deposited on the surface of a nickel alloy, titanium dioxide films on stainless steel, and corrosion layers formed on the magnesium alloy surface during the interaction with an ionic liquid are considered. These results give grounds to consider the proposed method for measuring the sample current as an efficient and informative addition to the conventional SIMS.