首页 | 本学科首页   官方微博 | 高级检索  
     


Surface morphology of highly mismatched InSb films grown on GaAs substrates by molecular beam epitaxy
Authors:Min Xiong  Meicheng Li  Liancheng Zhao
Affiliation:1. School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, P.R. China;2. School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, P.R. ChinaPhone: +86 451 86418745, Fax: +86 451 86415776
Abstract:InSb films on GaAs(001) substrates with and without GaAs buffer layer have been grown by molecular beam epitaxy. Rather than surface undulations, aligned ripples and pyramidal hillocks along the orthogonal 〈110〉 directions were observed on the surface of InSb films. Both the preferential growth and the termination of ripples were proved to be related to strain‐driven mass transport. A model was proposed to elucidate the formation of the hillocks, which are more efficient to relax strain than ripples. Due to the strain relaxation through hillocks with small bases predominantly, the surfaces of the InSb films grown without a GaAs buffer layer are smoother than those of films grown with a GaAs buffer layer. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Keywords:68.37.Ps  68.55.Jk  81.15.Hi
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号