Sequence of structural-phase states during implantation of C+, N+, and Si+ ions into molybdenum

The sequence of structural-phase changes in the surface layer of molybdenum during pulsed implantation of N⁺, C⁺, and Si⁺ ions has been studied. At radiation doses 5·10¹⁶ cm^–2 we detected qualitatively similar structural-phase transformations with the formation of highly dispersed secondary-phase particles (nitrides, carbides, and silicides), dislocations, point defects, and clusters of defects. At radiation doses (1–2)·10¹⁷ cm^–2 implantation of C⁺ and Si⁺ ions causes amorphization of the surface layer; nitrogen implantation is accompanied by the formation of continuous layers of the nitride phase on the surface.Siberian Physicotechnical Institute at the V. D. Kuznetsov State University, Tomsk. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 2, pp. 3–9, February, 1994.