Summary: Binary symmetric diblock copolymer blends, that is, low‐molecular‐weight poly(styrene‐block‐methyl methacrylate) (PS‐b‐PMMA) and high‐molecular‐weight poly(styrene‐block‐methacrylate) (PS‐b‐PMA), self‐assemble on silicon substrates to form structures with highly ordered nanoholes in thin films. As a result of the chemically similar structure of the PMA and the PMMA block, the PMMA chain penetrates through the large PMA block that absorbs preferentially on the polar silicon substrate. This results in the formation of nanoholes in the PS continuous matrix.
An atomic force microscopy image of the thin film obtained from the blend of low‐molecular‐weight PS‐b‐PMMA and high‐molecular‐weight PS‐b‐PMA. The regular array of nanoholes in the films surface is clearly visible.
