Summary: The communication provides a novel and alternative route to generate chemically tethered binary polymer‐brush pattern through two‐step surface‐initiated atomic‐transfer radical polymerization (SI‐ATRP). Polymer brush‐1 was prepared by SI‐ATRP, passivated by a reaction with NaN3, and etched with UV irradiation through a transmission electron microscopy grid to create exposed sites for the subsequently attached initiator on which polymer brush‐2 was grown.
Schematic representation of the resultant binary polymer brush patterns.
