An application of holography to complete stress analysis of photoelastic models

A new procedure is proposed by which holographic principles may be extended to include stress analysis of three-dimensional photoelastic models. A sixth independent equation can be obtained to permit a complete stress solution by using the double-exposure hologram technique in conjunction with an immersion tank. The salient feature of the method is that no stress relieving is necessary between exposures of the hologram. Two experiments were performed to compare the stress-relieving method to the immersion method. In both experiments, a two-dimensional model was used to simplify the demonstration of the general techniques, which are also applicable to slices from frozen-stress models.