首页 | 本学科首页   官方微博 | 高级检索  
     

TiN/TiB2异结构纳米多层膜的共格生长与力学性能
引用本文:魏 仑,梅芳华,邵 楠,董云杉,李戈扬. TiN/TiB2异结构纳米多层膜的共格生长与力学性能[J]. 物理学报, 2005, 54(10): 4846-4851
作者姓名:魏 仑  梅芳华  邵 楠  董云杉  李戈扬
作者单位:上海交通大学金属基复合材料国家重点实验室,上海 200030
基金项目:上海市纳米技术专项基金(批准号:No. 0352nm084)资助的课题.
摘    要:采用多靶磁控溅射法制备了一系列具有不同TiB2调制层厚度的TiN/TiB2纳米多层膜.利用x射线衍射仪、高分辨电子显微镜和微力学探针研究了TiB2层厚变化对多层膜生长结构和力学性能的影响.结果表明,在fcc-TiN层(111)生长面的模板 作用下,原为非晶态的TiB2层在厚度小于2.9nm时形成hcp晶体态,并与fcc-TiN 形成共格外延生长;其界面共格关系为{111}TiN//{0001}TiB2,〈110〉TiN//〈1120〉TiB2.由于共格界面存在晶格失配 度,多层膜中形成拉、压交变的应力场,导致多层膜产生硬度和弹性模量升高的超硬效应, 最高硬度和弹性模量分别达到46.9GPa和465GPa.继续增加TiB2层的厚度,TiB2形成非晶态并破坏了与TiN层的共格外延生长,多层膜形成非晶TiN层和非晶TiB< sub>2层交替的调制结构,其硬度和弹性模量相应降低.关键词:2纳米多层膜')" href="#">TiN/TiB2纳米多层膜共格生长晶体化力学性能

关 键 词:TiN/TiB2纳米多层膜  共格生长  晶体化  力学性能
文章编号:1000-3290/2005/54(10)/4846-06
收稿时间:2004-10-26
修稿时间:2005-03-03

The coherent growth and mechanical properties of non-isostructural TiN/TiB2 nanomultilayers
Wei Lun,Mei Fang-Hu,Shao Nan,Dong Yun-Shan and Li Ge-Yang. The coherent growth and mechanical properties of non-isostructural TiN/TiB2 nanomultilayers[J]. Acta Physica Sinica, 2005, 54(10): 4846-4851
Authors:Wei Lun  Mei Fang-Hu  Shao Nan  Dong Yun-Shan  Li Ge-Yang
Affiliation:State Key Laboratory of Metal Matrix Composites, Shanghai Jiaotong University, Shanghai 200030, China
Abstract:TiN/TiB2 nanomutlialyers with different TiB2 layer thickne ss were prepared using multi-target magnetron sputtering method. The effects of TiB2 layer thickness on the growth structure and mechanical properti es of nanomultialyers were studied by X-ray diffraction, high-resolution transmi ssion electron microscopy and nanoindentation respectively. The results reveal t hat the normally amorphous TiB2 layers crystallize in close-packed he xagonal structure when its thickness is less than 2.9 nm due to the template eff ect of cubic TiN layers. Coherent growth is found between TiN and TiB2 layers with the orientation relationship of {111}TiN//{0001}Ti B2,〈110〉TiN//〈1120〉TiB2. Because of th e lattice misfit, an alternating tensile/compressive stress field develops in th e nanomultilayers, which leads to the anomalous enhancement of hardness and elas tic modulus. Maximum hardness and elastic modulus of 46.9 and 465GPa are obtaine d at TiB2 layer thickness of 0.6nm. With increasing TiB2 l ayer thickness, amorphous TiB2 forms and blocks the coherent growth of the multilayers. Consequently, the hardness and elastic modulus of the films decrease gradually.
Keywords:TiN/TiB2 nanomultilayers   coherent growth   crystallization   mechanical properties
本文献已被 CNKI 维普 等数据库收录!
点击此处可从《物理学报》浏览原始摘要信息
点击此处可从《物理学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号