Dipole oscillator strengths,dipole properties and dispersion energies for SiF4 |
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| Authors: | ASHOK KUMAR MUKESH KUMAR WILLIAM J MEATH |
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| Institution: | 1. Department of Physics , Ch. Charan Singh University , Meerut, 250004, India;2. Department of Chemistry , University of Western Ontario , London, Ontario, N6H 5B7, Canada;3. S. V. College , Aligarh, 202001, India;4. Department of Chemistry , University of Western Ontario , London, Ontario, N6H 5B7, Canada |
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| Abstract: | A recommended isotropic dipole oscillator strength distribution (DOSD) has been constructed for the silicon tetrafluoride (SiF4) molecule through the use of quantum mechanical constraint techniques and experimental dipole oscillator strength data. The constraints are furnished by experimental molar refractivity data and the Thomas-Reiche-Kuhn sum rule. The DOSD is used to evaluate a variety of isotropic dipole oscillator strength sums, logarithmic dipole oscillator strength sums and mean excitation energies for the molecule. A pseudo-DOSD for SiF4 is also presented which is used to obtain reliable results for the isotropic dipole-dipole dispersion energy coefficients C6, for the interaction of SiF4 with itself and with 43 other species and the triple-dipole dispersion energy coefficient C9 for (SiF4)3. |
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