Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements |
| |
| Authors: | Loch R A Dubrouil A Sobierajski R Descamps D Fabre B Lidon P van de Kruijs R W E Boekhout F Gullikson E Gaudin J Louis E Bijkerk F Mével E Petit S Constant E Mairesse Y |
| |
| Institution: | FOM Institute for Plasma Physics Rijnhuizen, Nieuwegein, The Netherlands. r.a.loch@rijnhuizen.nl |
| |
| Abstract: | We characterize the phase shift induced by reflection on a multilayer mirror in the extreme UV range (80-93?eV) using two techniques: one based on high order harmonic generation and attosecond metrology (reconstruction of attosecond beating by interference of two-photon transitions), and a second based on synchrotron radiation and measurements of standing waves (total electron yield). We find an excellent agreement between the results from the two measurements and a flat group delay shift (±40?as) over the main reflectivity peak of the mirror. |
| |
| Keywords: | |
| 本文献已被 PubMed 等数据库收录！ |
