| HfO2薄膜的结构对抗激光损伤阈值的影响 |
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| 引用本文： | 高卫东,张伟丽,范树海,张大伟,邵建达,范正修. HfO2薄膜的结构对抗激光损伤阈值的影响[J]. 光子学报, 2005, 34(2): 176-179 |
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| 作者姓名： | 高卫东 张伟丽 范树海 张大伟 邵建达 范正修 |
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| 作者单位： | 中国科学院上海光学精密机械研究所薄膜中心,上海,201800 |
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| 基金项目： | 国家高技术863基金资助 |
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| 摘 要： | 利用蒸发氧化铪和离子辅助蒸发金属铪反应沉积氧化铪薄膜，对两种工艺下制备的氧化铪薄膜进行光学和结构以及激光损伤特性的研究. 实验结果表明，用金属铪反应沉积的氧化铪薄膜不仅结构均匀，并且具有较高的激光损伤阈值. 文章对损伤阈值和薄膜的结构及光学特性之间的关系进行了讨论.
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| 关 键 词： | 铪 氧化铪 薄膜 激光损伤阈值 |
| 收稿时间： | 2003-12-08 |
| 修稿时间： | 2003-12-08 |
Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold |
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| Affiliation: | (Research & Development Center for Optical Thin Films, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Science, Shanghai 201800) |
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| Abstract: | HfO 2 films have been deposited with electron beam evaporation of HfO 2 and ion assisted electron beam evaporation of Hf. Optical and structural properties and laser induce damage threshold of the films have been studied; it was found that HfO 2 film deposited with electron beam evaporation of Hf with ion assisted technology shows uniform structural properties and higher laser induced damage threshold. The relation between structural and damage threshold of HfO 2 films has also been studied. |
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| Keywords: | HfO_2 Film Laser-induced damage threshold |
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