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Analysis of thin solid films and surfaces by infrared spectroscopy
Authors:Peter Grosse
Affiliation:(1) I. Physikalisches Institut der RWTH, Aachen University of Technology, D-W-5100 Aachen, Federal Republic of Germany
Abstract:Thin solid films and surfaces are characterized by IR spectroscopy, based on reflectance and transmittance measurements, in particular with polarized light at oblique incidence. Thus two independent data sets fors- andp-polarization are available. Atp-polarization additional absorption lines at the zeros of the dielectric function are observed (ldquoBerreman-moderdquo). The interpretation of the measured spectra is carried out by a fit procedure to simulate the observed spectra. As a result the specimens are characterized in terms of vibronic resonances and their oscillator strengths or concentration, thicknesses of various films in a stack of layers, profiles of depth depending chemical composition, or concentration and mobility of conduction electrons.All examples are relevant for application in technology, as microelectronics, thin film technology, catalysis, e.g. The results of the IR analysis are compared with those of other analytical methods as SIMS, RBS, and AES. The agreement is very good. One important advantage of the IR analysis, however, is the fact that it is a non-destructive method.
Keywords:IR spectroscopy  thin films MOS  heterostructures  adsorbates
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