首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Investigation of silicon-on-sapphire structures by means of TEM
Authors:D A Pavlov  P A Shilyaev  E V Korotkov  N O Krivulin  A I Bobrov
Institution:1. Lobachevsky State University, Nizhni Novgorod, 603950, Russia
Abstract:The initial stages of the molecular beam epitaxy (MBE) growth of silicon-on-sapphire (SOS) are investigated via transmission electron microscopy (TEM). The sample preparation procedure is improved to study SOS structures by TEM. It is shown that silicon in the shape of 3D islets can form on a continuous silicon layer grown on sapphire.
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号